Engineered for Performance Across Critical Sectors

The Sputtek Cathodic Arc is a unique process conducted in a specifically designed machine which allows plasma densification.

Plasma densification creates coatings with higher hardness, lower coefficient of friction, higher thickness and lower internal stresses.

Added sputtering processes allow to deposit coatings from the cathode materials not suitable for the cathodic arc process, and to grow nano-composite and nano-layered coatings.

STAMPINGSPUN 2 Universal PVD Coating Centre

The SPUN 2 high capacity PVD coating system allows to coat up to 1,200 kg in a single cycle

SPUN 4 Modular Duplex Universal

The SPUN 4 High Capacity PVD Coating System allows to coat up to 3,000 kg in a single cycle​